Nickel Plated (Ni/P) Media Cleaning & Texturing

Ni/P Media	Surfactants, cleaners, etchants, acids and alkalis. High purity, ultra-filtered (0.2 um).
	NuWet PG 3: Acid Based disk substrate cleaner NuRinse S 3: Neutral pH, disk Substrate cleaner.
	NuLap TA: Disk polishing slurry solution. Aluminum oxide Polishing steps.
	NuRinse BR 10: Near Neutral Buffered Rinse/cleaning solution post polish cleaning applications. Also for texture "buff" cleaning using tape media. NuKlean WX 25A: Acidic Post Polish Ultrasonic Immersion tank cleaner.
	NuWet DT Series: Highly Alkaline Amine and potassium hydroxide (KOH) based surfactant cleaner. For Very Aggressive Cleaning. NuWet DM Series: Similar to DT containing no Amines, less aggressive than DT Series on Ni/P surface.
	NuLap BQ Series: Disk texturing slurry solution. diamond, colloidal silica and Aluminum oxide texture process steps. NuLap MC Series: Disk texturing slurry solution. diamond, colloidal silica and Aluminum oxide texture process steps.
	NuRinse BR 10: Near Neutral Buffered Rinse/cleaning solution post polish cleaning applications. Also for texture "buff" cleaning using tape media.
	NuRinse BR, NuKlean WA 12: Buff Tape Cleaning NuKlean WX 25A
	NuWet DT Series: Highly Alkaline Amine and potassium hydroxide (KOH) based surfactant cleaner. For Very Aggressive Cleaning. NuWet DM Series: Similar to DT containing no Amines, less aggressive than DT Series on Ni/P surface.
	NuRinse S 3: Buffered to neutral pH mild cleaning surfactant system with good wetting characteristics.
	NuWet 133: Non-ionic blended surfactant cleaner containing no builders, chelates, EDTA, acids, or caustics or amines. NuRinse S3: Buffered to neutral pH mild cleaning surfactant system with good wetting characteristics.

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Nickel Plated (Ni/P) Media Cleaning & Texturing

Ni/P Media

Surfactants, cleaners, etchants, acids and alkalis. High purity, ultra-filtered (0.2 um).

NuWet PG 3: Acid Based disk substrate cleaner NuRinse S 3: Neutral pH, disk Substrate cleaner.

NuLap TA: Disk polishing slurry solution. Aluminum oxide Polishing steps.

NuRinse BR 10: Near Neutral Buffered Rinse/cleaning solution post polish cleaning applications. Also for texture "buff" cleaning using tape media. NuKlean WX 25A: Acidic Post Polish Ultrasonic Immersion tank cleaner.

NuWet DT Series: Highly Alkaline Amine and potassium hydroxide (KOH) based surfactant cleaner. For Very Aggressive Cleaning. NuWet DM Series: Similar to DT containing no Amines, less aggressive than DT Series on Ni/P surface.

NuLap BQ Series: Disk texturing slurry solution. diamond, colloidal silica and Aluminum oxide texture process steps. NuLap MC Series: Disk texturing slurry solution. diamond, colloidal silica and Aluminum oxide texture process steps.

NuRinse BR 10: Near Neutral Buffered Rinse/cleaning solution post polish cleaning applications. Also for texture "buff" cleaning using tape media.

NuRinse BR, NuKlean WA 12: Buff Tape Cleaning NuKlean WX 25A

NuWet DT Series: Highly Alkaline Amine and potassium hydroxide (KOH) based surfactant cleaner. For Very Aggressive Cleaning. NuWet DM Series: Similar to DT containing no Amines, less aggressive than DT Series on Ni/P surface.

NuRinse S 3: Buffered to neutral pH mild cleaning surfactant system with good wetting characteristics.

NuWet 133: Non-ionic blended surfactant cleaner containing no builders, chelates, EDTA, acids, or caustics or amines. NuRinse S3: Buffered to neutral pH mild cleaning surfactant system with good wetting characteristics.

NuWet PG 3: Acid Based disk substrate cleaner
NuRinse S 3: Neutral pH, disk Substrate cleaner.

NuRinse BR 10: Near Neutral Buffered Rinse/cleaning solution post polish cleaning applications. Also for texture "buff" cleaning using tape media.
NuKlean WX 25A: Acidic Post Polish Ultrasonic Immersion tank cleaner.

NuWet DT Series: Highly Alkaline Amine and potassium hydroxide (KOH) based surfactant cleaner. For Very Aggressive Cleaning.
NuWet DM Series: Similar to DT containing no Amines, less aggressive than DT Series on Ni/P surface.

NuLap BQ Series: Disk texturing slurry solution. diamond, colloidal silica and Aluminum oxide texture process steps.
NuLap MC Series: Disk texturing slurry solution. diamond, colloidal silica and Aluminum oxide texture process steps.

NuRinse BR, NuKlean WA 12: Buff Tape Cleaning
NuKlean WX 25A

NuWet DT Series: Highly Alkaline Amine and potassium hydroxide (KOH) based surfactant cleaner. For Very Aggressive Cleaning.
NuWet DM Series: Similar to DT containing no Amines, less aggressive than DT Series on Ni/P surface.

NuWet 133: Non-ionic blended surfactant cleaner containing no builders, chelates, EDTA, acids, or caustics or amines.
NuRinse S3: Buffered to neutral pH mild cleaning surfactant system with good wetting characteristics.